Used AMAT / APPLIED MATERIALS P5000 #9083278 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced plasma-enhanced chemical-vapor deposition (PECVD) reactor designed to provide precise temperature control, ultra-fast material deposition, and deposition process control in a variety of surface treatments. AMAT P-5000 is ideal for applications such as thin-film deposition, surface functionalization, surface engineering, and semiconductor processing. APPLIED MATERIALS P 5000 features an innovative dual-zone plasma source that allows for the precise control of the temperatures of the chamber, substrate and target materials. The precise temperature control ensures fast, reproducible deposition rates with minimal stress. P5000 also provides precise control of the plasma energy. This allows for customized energy distribution across the target surface, which further enhances the deposition process. AMAT / APPLIED MATERIALS P-5000 can be used to deposit both conducting and non-conducting materials, in either dry- or wet-type configurations. It has an adjustable pressure range from low to ultra-high, allowing for precise control of the deposition process. AMAT / APPLIED MATERIALS P 5000 also features a large substrate area, which allows for the fabrication of complex structures. APPLIED MATERIALS P-5000 incorporates a variety of advanced diagnostics and process controls. The probe equipment enables the user to analyze and monitor reactive ion etching during the deposition process. The analytics system allows for real-time monitoring of the deposition process, as well as the production of diagnostics and controls. The process control module allows for the rapid adjustment of reactor parameters, enabling the user to make process changes on the go. In addition, AMAT P5000 is equipped with an automated bath wafer transfer unit that enables wafers to be transported and automatically processed. This machine is also capable of handling wafers with a larger diameter or thickness. The bath tool is able to clean and rinse wafers automatically for added safety. AMAT P 5000 is an ideal solution for high-precision deposition and surface engineering applications, as it provides its users with precise temperature control, fast deposition rates, and advanced diagnostics and process control capabilities.