Used AMAT / APPLIED MATERIALS P5000 #9083280 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9083280
Vintage: 1996
PECVD system Process: SiO3, SiN 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a sophisticated, state-of-the-art plasma reactor designed for advanced etching and deposition processes in a range of industries including semiconductor, display, photovoltaic and data Storage. AMAT P-5000 has opened up new possibilities for mass production of advanced electronics and is widely considered one of the most reliable and versatile plasma reactors available. The flexibility of APPLIED MATERIALS P 5000 is one of its main advantages. It is available with multiple chamber sizes, substrate sizes, and capabilities, allowing for a customized solution for each application. Additionally, the equipment is designed to be relatively compact, with a two-level design for easy installation into a standard cleanroom. AMAT / APPLIED MATERIALS P-5000 features a range of advanced features that ensure reliable and repeatable processes. The chamber is equipped with a power supply capable of delivering up to 1 kW of RF power, with additional port options allowing for up to multiple additional sources of power. Furthermore, the system supports a wide range of recipes and higher pulse energies, making it well-suited for difficult deposition and etching projects. To maximize efficiency, P 5000 also comes equipped with a precise gas delivery unit. This machine allows for both precise control over the gas flow rate and total amount of gas used. Overall, this advanced gas delivery technology allows for a high degree of repeatability and precise control over the growth and etch process. Finally, P-5000 includes a high-tech data collection and analysis package. Combined with the recipe management tool, this allows for real-time monitoring of process progress and performance on a graph or diagram. This advanced feature set makes AMAT P5000 ideal for in-depth process characterization and optimization. In conclusion, APPLIED MATERIALS P5000 is a powerful and versatile plasma reactor that extends the capability of etching and deposition processes across a range of industries. With its advanced technical features, precise gas delivery, comprehensive data collection and analysis asset, and recipe management capabilities, AMAT P 5000 is a reliable option for today's advanced process needs.
There are no reviews yet