Used AMAT / APPLIED MATERIALS P5000 #9083283 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9083283
Vintage: 1990
PECVD system Process: SiO5, SiN 1990 vintage.
AMAT / APPLIED MATERIALS P5000 Reactor is a state-of-the-art equipment designed for advanced materials and film deposition. It utilizes electron beam-enhanced chemical vapor deposition (EBCVD), which is a chemical process that layers multiple thin layers of material onto a substrate using the energy from an electron beam to dissociate reactive gas molecules into atoms that react with and coat the substrate. AMAT P-5000 is a single-wafer 13.56 MHz RF generator-powered tubular reactor. It features high-density plasma for uniform deposition, and is suitable for a wide range of advanced materials deposition applications. The system includes a dual-zone hot-wall electron-beam gun for deposition rate control, and the Enhanced Power ARC+ feature, which improves deposition rate and uniformity. The Enhanced Heat Tunnel feature allows for high-temperature uniformity across the substrate. The cool-wall RF-controlled quartz process chamber features 5" and 7" wafer pods with a 4" option, providing quick wafer change-out. The unit offers flexible film deposition, as it is designed to support a wide range of materials and deposition techniques. Examples include metallization, CMP, and oxidation/nitridation. The large, slide-out low-maintenance E-beam source retainer allows for quick and easy maintenance, saving time and cost. The machine also provides advanced interfaces for controlling the deposition process and offers exceptional monitoring of deposition output, wafer temperature, and other parameters. APPLIED MATERIALS P 5000 Reactor is designed with safety and user convenience in mind. The tool's safety features include an oxygen and gas shut-off asset, cleanroom access control, and remote monitoring and alarm features. Additionally, the model is compatible with a number of deposition accessories, allowing for easier integration of components, such as load locks, workstations, and dummy substrates. Overall, AMAT P5000 Reactor provides a reliable, versatile platform for advanced materials deposition. With its high-performance features and ease of use, the equipment provides a great solution for those looking for a high-quality deposition system.
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