Used AMAT / APPLIED MATERIALS P5000 #9083285 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9083285
Vintage: 1993
PECVD system Process: SiO7, SiN 1993 vintage.
AMAT / APPLIED MATERIALS P5000 is a state-of-the-art reactor designed for advanced research and state-of-the-art fabrication processes in the semiconductor, nano-electronic and MEMS industries. This advanced processing tool is designed to combine the flexibility of standalone chemical mechanical polishing and planarization with the power of advanced etching and deposition. AMAT P-5000 can be used to create a variety of feature sizes with film thicknesses ranging between 1 to 10 micrometers. The equipment is equipped with single wafer and batch processing capabilities, which enables it to provide the highest level of process flexibility, efficiency, and cost-effectiveness. The reactor can process substrates up to 300 mm in size and from wafers ranging from 200mm to 150 mm in thickness. Additionally, the system boasts a maximum processing pressure of 8 bar, with adjustable RF frequencies up to 25MHz for power and gas delivery. APPLIED MATERIALS P 5000 features many features, such as precise temperature control for precise process monitoring, a variable combination of plasma sources for optimum gas throughput, automatic harmonic plasma control for improved etching, multi-resource high-level substrate treatment, and the latest high-tech substrate wafer technologies. Additionally, the reactor is equipped with a compact chamber, which enables the unit to operate efficiently in confined spaces. APPLIED MATERIALS P5000 also offers many advantages over traditional batch processing systems. The machine is capable of producing a wide range of material characteristics with total control over temperature, pressure, process time, and gas composition. Additionally, the tool has automatic harmonic pulse control for improved etching. This advanced processing tool allows users to create thin-film layers with greater precision, while maintaining the highest level of quality and process consistency. Additionally, the asset offers a wide range of safety features, such as built-in safety mechanisms, multi-layered insulation, and a robust leak detection model. Overall, P5000 is an extremely advanced reactor designed to provide the highest level of process control and flexibility for industry leading processes. This powerful reactor offers a variety of features, including precise temperature control, adjustable RF frequencies, and a wide range of safety features. The equipment is strong and reliable, offering the highest level of efficiency and cost-effectiveness.
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