Used AMAT / APPLIED MATERIALS P5000 #9083287 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9083287
Vintage: 1996
PECVD system Process: SiO8, SiN 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a production-capable reactor ideal for advanced materials deposition and etch processing. It can be used for applications such as III-V and multilayer thin film deposition, electronic device fabrication, semiconductor device fabrication, and advanced semiconductor technologies such as MEMS, LED, and metallization. AMAT P-5000 features a wide range of capabilities and can process a variety of materials. It has a lower pressure system that enables processing of high-dielectric substrates, and high-vacuum processing up to 9.5 x 10-7 Torr, allowing for non-reactive, very low-pressure deposition. It has multiple high-current, high-voltage options and is capable of precision substrate heating up to 600°C, making it an ideal tool for the fabrication of high-performance devices. APPLIED MATERIALS P 5000 system is a powerful tool for advanced etch and deposition applications. The reactor chamber is a cylindrical design to ensure a uniform, consistent process that enables materials processes such as deep thermal annealing, firing-rate closed-loop control, sub-second plasma initiation, and pulsing of etch and deposition processes. It also offers a variety of control options for optimal flexibility and process accuracy, including data acquisition and real-time process monitoring. APPLIED MATERIALS P5000 is designed to be a modular, automated system, with a range of options that enable a faster material deposition and etch process. It has an automated sample in and out process, as well as robotics that allow rapid transport and loading of sample mixtures. This automation makes it a hygienic and safe choice for a variety of production processes. Furthermore, P-5000 can be upgraded with a range of additional components, such as a mass flow controller and refrigerated circulation unit, for even more enhanced performance. Overall, AMAT P 5000 offers a dependable and versatile platform for advanced etch and deposition processes. With its unparalleled performance capabilities, AMAT P5000 reactor can serve as an extremely powerful tool for a range of material processing requirements.
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