Used AMAT / APPLIED MATERIALS P5000 #9083304 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance plasma etch reactor that has been patented by AMAT. It is a state-of-the-art piece of equipment that enables the microfabrication of integrated circuits and other electronic components. The reactor is designed to perform selectively etching and deposition processes for the fabrication of integrated circuits and other micro-devices. It uses a combination of high-frequency radio waves and a blend of reactive gases to make precise etching and deposition results. This reactor is capable of performing the most challenging plasma etch and deposition processes with a high degree of accuracy and repeatability. AMAT P-5000 is built upon the latest advanced technology in plasma etch reactors. It employs a low-frequency plasma source that allows for extremely precise control and excellent uniformity of the plasma resulting in better feature definition and improved process times. The extended working volume of the reactor also provides greater throughput and efficiency when used in large-scale production. APPLIED MATERIALS P 5000 plasma etch reactor features secondary sources of ionization, such as ion beams, electrons, and ultraviolet light, which can be used to improve feature resolution and process speeds. The advanced two-channel plasma source delivers both positive and negative ions allowing for precise etch control. The wide variety of reactive gases used in the process further allows for a customizable etching process that can be tailored to the requirements of any particular process. The reactor is also fitted with a quad-based RF shield system, providing a balanced and reliable plasma environment that is free of external disturbances. The system is constructed using lapped surfaces that are interconnected with micro-porous substrates, providing effective far-field shielding and minimal hot-spot temperatures. P5000 plasma etch reactor is the most advanced system in its class and provides optimal process results with the utmost robustness and reliability. Its cutting-edge design and ability to customize processes makes it ideal for a wide range of semiconductor applications, such as the production of high-speed digital and analog components.