Used AMAT / APPLIED MATERIALS P5000 #9083306 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9083306
Vintage: 1996
PECVD system Process: SiO, SiN 1996 vintage.
AMAT / APPLIED MATERIALS P5000 is a versatile Reactor designed for processing semiconductor materials. It is specifically designed for vapor phase growth and etching applications, providing repeatable, reliable processes for wafer fabrication. AMAT P-5000 reactor is based on a modular design with an optional secondary chamber for a more intricate and customized process. It is also designed to meet the demands of single wafer processing. The core component of APPLIED MATERIALS P 5000 is the Multi-module Controller, which provides a comprehensive platform for monitoring and controlling of the various operating parameters. The controller is used to load and unload wafers and gases, and to monitor pressure, temperature and flow. Additionally, it enables the fine-tuning of the process by adjusting the operating parameters. APPLIED MATERIALS P5000 is equipped with a resistive heating zone and a RF induction zone that performs the main functions of the processing chamber. The Heating zone provides uniform, higher temperatures, while the lower temperatures are provided by the RF induction zone. Both zones have the capacity to handle overpressure, vacuum, and forced exhaust for customized process capabilities. An additional feature of AMAT / APPLIED MATERIALS P-5000 is the "Air Gap" between the reactor walls and the substrate. This gap helps to minimize the interference of heat and particles between the substrate and the surface of the chamber, maintaining the high levels of reliability and repeatability that characterize P-5000's performance. The optional Secondary Chamber allows for a more versatile and tailored process. The chamber is pressure tight and enables the use of two independent gas sources. This feature can be used to supply multiple gases, or to develop advanced processes with additional gases or acids. APPLIED MATERIALS P-5000 utilizes a variety of safety mechanisms. It has an integrated cylinder and manifold system, which enables safe and uniform gas supply connection, and provides protection against accidental injection of incorrect gases. AMAT P 5000 is also equipped with an overpressure burst disc that is capable of instantly venting off any excessivei pressure. AMAT P5000 is a robust and reliable tool for wafer fabrication, providing a safe and repeatable process for a variety of semiconductor processes. With its versatile features, AMAT / APPLIED MATERIALS P 5000 is the perfect choice for any processing environment .
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