Used AMAT / APPLIED MATERIALS P5000 #9083567 for sale

AMAT / APPLIED MATERIALS P5000 is a semi-automated plasma reactor for producing Silicon-based thin films. This reactor is equipped with a completely computerized equipment for controlling the process environment and for monitoring performance. This allows for precise control of film thickness and uniformity as well as control of the rate of deposition. The reactor is composed of a collar chamber, a base chamber, and a controller panel. The collar chamber is the main deposition chamber which houses a cylindrical cathode, the source material which provides the material to deposit, and vacuum pump which creates the vacuum in the chamber. The base chamber houses the gas delivery system which controls the flow of precursor and the activation energy used in the plasma form. The controller panel is the computerized control unit which is used to monitor and adjust the variables within the process environment. AMAT P-5000 applies a plasma form through the delivery of precursor and activation energy to the main deposition chamber. The precursor is a feedstock material that is broken down by the process of ionization and activated by the activation energy. The precursor and activation energy are divided between the two chambers by their respective chamber opening valves. The collar chamber is then sealed so that it can operate at a vacuum of up to 10-7 Torr. The ionized precursor and activation energy create a plasma form which is used to deposit the thin films onto the wafer. The heat generated from the plasma also drives out the oxygen from the thin films which is needed for a subsequent passivation process. The films are deposited at a typical rate of 10-20 Angstroms/s, with a deposition window of 0.4-4.0 Angstroms. This process creates films that are extremely uniform and that have excellent adhesion properties. Films can range from three to several hundred Angstroms thick, with a thickness and uniformity that is easily controlled. Film hardness can be customized and can range from 40 Kgf to 17 Kgf. The rate of deposition and other variables such as pressure, RF power, flow rate and pulse width can be easily adjusted with the computerized control machine. APPLIED MATERIALS P 5000 is an ideal tool for producing Silicon-based thin films in a variety of applications. It is used in industries such as flat panel displays, photovoltaic cells, MEMS, and micro-electronics. With its advanced process control, P 5000 has unparalleled performance for producing thin films with precise control and perfect uniformity.