Used AMAT / APPLIED MATERIALS P5000 #9084588 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an advanced, automated Plasma-Enhanced Chemical Vapor Deposition (PECVD) equipment which is capable of performing a wide range of processes in the fabrication of advanced electronic materials. AMAT P-5000 reactor features multiple plasma sources, allowing for simultaneous deposition of up to six separate films. This allows for the creation of devices over a wide range of thicknesses, crystallinities, and densities, and is capable of achieving nanometer-scale accuracy in device fabrication. APPLIED MATERIALS P 5000 reactor is highly configurable, featuring multiple reactors and sources, as well as independently operated on/off valves and other components. This allows for a wide range of process recipes to be developed and executed, enabling the user to produce structures in multiple electronic materials and structures. This multi-process configuration also gives the user greater flexibility in the type of process recipes that can be used, allowing for a variety of custom-tailored solutions based on design requirements or experimental needs. APPLIED MATERIALS P5000 reactor also features an automated material source control system, which allows for precise timing of individual reactants within the reactor. This helps to ensure that the desired reaction occurs uniformly throughout the substrate, resulting in uniform layers with consistent electrical and optical properties. In addition, P5000 reactor can be used for templating and for patterning of multi-layer films. APPLIED MATERIALS P-5000 reactor is capable of operating at temperatures ranging from 77K to 650K, and at pressures from 500 mBar to 950 mBar. It also features an integrated closed-loop flow control unit that enables precise control of the processing environment. This helps to ensure the quality and reproducibility of the layers produced by the device. AMAT P5000 reactor is highly reliable and compact, with many components designed for easy removal and reassembly. This makes it an ideal choice for rapid prototyping in research laboratories, enabling rapid product development and bringing novel electronic materials to market more quickly. In conclusion, AMAT / APPLIED MATERIALS P 5000 reactor is a versatile and reliable PECVD machine that can be used for a wide range of processes in the fabrication of advanced electronic materials. With its multiple plasma sources, closed-loop flow control, and automated source control tool, P-5000 reactor is capable of producing highly uniform films in a range of thicknesses, crystallinities, and densities. In addition, its easy removal and reassembly make it a great choice for rapid prototyping in research laboratories.