Used AMAT / APPLIED MATERIALS P5000 #9087456 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a state-of-the-art thin film deposition equipment designed for the deposition of a variety of thin materials on semiconductor wafers. AMAT P-5000 reactor is capable of depositing high-quality depositions of epitaxial silicon on 200mm and 300mm wafers, as well as depositing various thin films such as amorphous silicon, metal oxides, hafnium-based oxides, and silicides. Additionally, it can deposit thin films of organic materials and metal-layers of aluminum and copper. APPLIED MATERIALS P 5000 reactor is a single-wafer, closed-space reactive thermal processing system. It includes an ion beam source for ionizing and directing gas flow in the deposition chamber, a quartz process window for controllable inflow of high-purity gaseous precursors, a showerhead placed just above the process window to introduce ions into the chamber and direct them on to the substrate surface, a moving substrate holder that is used to accurately position each substrate in the process chamber and a turbo pumping unit to maintain a vacuum within the chamber during film deposition. The machine also includes a precision robotic arm for substrate loading and unloading, and a gas handling tool with individual flow controllers for each gas used in the deposition process. The single wafer reactor of AMAT P 5000 is able to achieve a maximum temperature of 900°C and can be used at temperatures from room temperature up to the maximum temperature. It can also be used in an oxygen-enriched environment to enhance the rate of film deposition and reduce the deposition temperature. The asset also features integrated scan heads that allow for measurement of material characteristics of the deposited layer such as sheet resistance, sheet doping, and film thickness. AMAT / APPLIED MATERIALS P-5000 is a versatile tool for thin-film deposition that allows for precision and accurate deposition due to its unique design and features. The model is capable of deposition of a variety of thin film materials with excellent results and is suitable for use in clean room environments. The equipment is highly automated and relatively easy to use with its robot arm, power control, and process monitoring systems designed to increase the productivity of the deposition process.