Used AMAT / APPLIED MATERIALS P5000 #9092874 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9092874
Wafer Size: 6"
Deposition system, 6" Process capability: 30pph Chamber 1: Oxide: LH DryVAC 100S, RUVAC 250, ENI 12B-1250W Chamber 2: Oxide: LH DryVAC 100S, RU VAC 250, ENI 12B-1250W Chamber 3: Oxide: LH DryVAC 100S, RUVAC 250 Controller type: PC S/W Rev.: ROSS 4.8 Process Gases: TEOS/O2?C3F8 External cooling: Water cooled.
AMAT / APPLIED MATERIALS P5000 is a high-temperature reactor designed for process development, joint development and production of advanced materials. This system is capable of performing chemical vapor deposition (CVD) and chemical mechanical polishing (CMP) processes in a completely automated and highly efficient manner. This reactor utilizes the latest technology in CVD and CMP to provide the highest level of process control and yield. AMAT P-5000 is designed with a vertical reactor chamber, housing three corresponding slices for loading and unloading of substrates. APPLIED MATERIALS P 5000's vertical design allows for a wide range of substrate materials to be supported and processed within the same plasma chamber. The process program of APPLIED MATERIALS P5000 is fully automated and is designed to work with sophisticated recipes, allowing for an optimal and reproducible deposition and polishing process. A specially designed multi-gas delivery system allows for the ability to precisely control the delivery of gases during the CVD process, providing greater control and quality of the process. Depending on the material requirements, P-5000 can be applied with up to three reactant gases and one purge gas at the same time. P5000 is capable of performing CMP processes at temperatures up to 500°C, with a uniformed substrate temperature across the entire substrate surface. A unique water flow system ensures that a reliable and efficient CMP process is achieved, while an independent residence time management guarantees an optimized and uniformed treatment process. AMAT P 5000 is adept with advanced automation capabilities, operating with a communication interface such as the standard communication protocol (SCPI). It also supports remote diagnostics and online monitoring of the CVD and CMP process, allowing for real-time process monitoring and adjustments. AMAT / APPLIED MATERIALS P 5000 is designed for high productivity and yield, and is suitable for automated production of advanced materials. With features such as precise process control, advanced automation capabilities and high-temperature CMP processes, AMAT P5000 provides a robust solution for producing high-quality advanced materials.
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