Used AMAT / APPLIED MATERIALS P5000 #9093623 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9093623
Wafer Size: 8"
Vintage: 1997
Poly etcher, 8", 1997 vintage.
AMAT / APPLIED MATERIALS P5000 is a chemical mechanical polishing (CMP) reactor designed to provide a high level of substrate planarity and surface smoothness. Developed using advanced manufacturing technology and engineered to suit a variety of fabrication requirements, AMAT P-5000 reactor is a reliable and reliable platform for a wide variety of CMP processes. APPLIED MATERIALS P 5000 reactor features one of the largest polishing chamber footprints available, allowing for large-scale substrate processing of up to 450mm diameter wafers. The reactor is capable of handling a variety of process chemistries and provides reduction of surface roughness through high-pressure polishing. P 5000 features powerful slurry filtration capabilities for enhanced cleaning results, as well as a built-in fixturing equipment for efficient substrate handling. Additionally, AMAT / APPLIED MATERIALS P 5000 reactor can be easily integrated with existing plantwide control systems. The design of APPLIED MATERIALS P5000 reactor integrates the latest in CMP technology to maximize performance. The reactor features a removaUe and reliably sealed polishing chamber design, with a robotic arm that automatically moves wafers across multiple polishing stations. This allows AMAT P 5000 to achieve higher production efficiency compared to traditional CMP reactors, while maintaining uniform substrate polishing results. Furthermore, APPLIED MATERIALS P-5000 features advanced perfluoropolyether (PFPE) based polishing pads for clean, effective substrate polishing. In addition to P5000 reactor's robust design, a variety of advanced process control technologies are also integrated into the system. This includes real-time optical unit monitoring of the CMP process, on-the-fly process parameters adjustments, predictive maintenance diagnostics, automatic wafer handling, and process history database logging. By leveraging these automated process control technologies, AMAT P5000 is capable of delivering consistent process results at speed and yield. AMAT / APPLIED MATERIALS P-5000 reactor is designed to provide high-quality results and reliable operation in production settings. To ensure the highest level of performance, P-5000 is capable of leveraging a variety of performance tuning parameters for customization to specific application requirements. Additionally, the reactor includes a comprehensive set of productivity monitoring tools to provide a comprehensive view into the performance of the machine. Overall, AMAT / APPLIED MATERIALS P5000 reactor is a reliable and robust CMP platform equipped with a variety of features to enable efficient and consistent substrate polishing performance for a variety of fabrication requirements. AMAT P-5000 is a reliable and reliable tool for achieving high levels of substrate planarity and surface smoothness.
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