Used AMAT / APPLIED MATERIALS P5000 #9094229 for sale

AMAT / APPLIED MATERIALS P5000 is a high performance physical vapor deposition (PVD) reactor specifically designed for the deposition of semiconductor materials. It features a unique patented chamber design, enabling high throughput and reliability for a wide range of applications. AMAT P-5000 is capable of utilizing a wide range of metallic and dielectric materials, such as aluminum and titanium, as well as new generation compounds, such as gallium nitride. It is an ultra-wide chamber reactor which enables high throughput and a high level of uniformity to reduce the need for additional processing operations. The key components of APPLIED MATERIALS P 5000 include a process chamber, a wafer boat and an RF source. The process chamber has a wide chamber design that enables a uniform coverage of whichever material is being deposited. This ensures that the wafer is coated in a consistent manner, reducing wasted time and energy in processing. The wafer boat is designed to allow for efficient loading, unloading and shifting of up to 270 wafers. It is constructed from titanium for increased durability and longevity. Finally, the RF source is used to supply the high power necessary to energize the material being deposited. This results in higher deposition rates then most other approaches. The combination of these components provides a highly efficient and repeatable deposition process for semiconductor materials. In conclusion, APPLIED MATERIALS P-5000 is an ideal solution for depositing a wide range of materials for semiconductor devices. It utilizes a unique, patented chamber design to enable high throughput and uniformity. This combination of features ensures efficient and reliable deposition, giving users the confidence and assurance they need to trust the results of APPLIED MATERIALS P5000.