Used AMAT / APPLIED MATERIALS P5000 #9096152 for sale

AMAT / APPLIED MATERIALS P5000 is a dedicated reactor designed for plasma deposition applications. This reactor is designed to process substrates at temperatures of up to 700°C. It utilizes the latest advancements in plasma deposition technology to deliver the highest quality thin-film applications. AMAT P-5000 is designed to suit a wide range of materials, from dielectrics to semiconductors and metals. The reactor chamber is vacuum sealed and consists of two independently controlled variable vacuum ports. This allows materials to be processed in ultra-high vacuums as low as 10-7 Torr. The ports also give the user more control over the process parameters during deposition. The chamber also features a large plasma source, allowing for a large range of plasma densities, allowing for a wide range of deposition requirements. The power supply/controller has a built in plasma monitoring system and is capable of providing a variety of power profiles, including single-pulse, burst pulse and power-boosting modes. There is also a system for controlling the energy requirements of the plasma deposits, allowing for excellent control over the deposition process. In addition, an in-situ optical emitter and detector system allows for the detailed observation of the process. APPLIED MATERIALS P 5000 is an advanced, highly efficient tool for plasma deposition. Its combination of features provides excellent control over the deposition process, allowing the user to produce quality films with tight process parameters. Its high level of flexibility make it suitable for a wide range of applications and its robust construction means it can be used in harsh, industrial environment with minimal maintenance requirements.