Used AMAT / APPLIED MATERIALS P5000 #9097963 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9097963
Metal etcher P5000 Metal Frame Remote AC Rack RF Gen Rack Mini Controller Monitor Rack Missing parts: VDS Assy Signal/Power Cables Umbilical Cables Chiller.
AMAT / APPLIED MATERIALS P5000 is an advanced plasma-enhanced chemical vapor deposition (PECVD) reactor. It is a production-ready tool designed to help manufacturers optimize their processes and increase yield. AMAT P-5000 reactor is a low-pressure, large-area, scalable deposition equipment capable of producing oxide, nitride and poly-silicon layers. It is especially useful in the deposition of advanced integrated circuit (IC) devices and in the production of large-area displays and photovoltaic (PV) devices. APPLIED MATERIALS P 5000 system is a flexible platform that enables high-precision control over the deposition process, allowing for the production of ultra-thin gate oxides, gate-stacks and diffusion layers. Its low-pressure environment reduces oxidation and contamination, resulting in thinner, more uniform layers with better electrical properties. By using an inert gas environment of nitrogen or helium, AMAT / APPLIED MATERIALS P-5000 reactor allows for high throughput and repeatability, with minimal source and showerhead erosion. AMAT / APPLIED MATERIALS P 5000 unit features an advanced substrate heating machine that ensures uniform, high-temperature uniformity across the wafer surface and provides excellent in-situ metrology. This enables accurate real-time process control and reduces tool downtime due to challenging substrate chemistries. AMAT P 5000 reactor also provides state-of-the-art quartz monitoring to measure the spectral emissions of different species and to optimize the deposition conditions for different processes. APPLIED MATERIALS P-5000 tool can be configured with multiple lower chamber processes, including remote plasma, post-etch plasma, advanced etch and deposition processes. Advanced magnetron sputtering, PVD and wet deposition processes are available for the lower chamber as well. An integrated, automated wafer handling asset with robot-arm end-effectors provides fast and reliable loading and unloading of the wafer. AMAT P5000 model is equipped with sophisticated computer-controlled process modules offers great ease-of-use. The P5000s modular architecture ensures quick and easy upgrades, reducing the cost of ownership. P-5000 also offers fast cycle times, low emissions, automatic maintenance protocols and easy integration into existing manufacturing networks. P 5000 equipment is highly reliable and efficient, making it an ideal choice for manufacturers looking to optimize their processes and increase throughput.
There are no reviews yet