Used AMAT / APPLIED MATERIALS P5000 #9102224 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9102224
Wafer Size: 8"
System, 8" (2) CVD Chambers Etch chamber.
AMAT / APPLIED MATERIALS P5000 is a process reactor designed for high-temperature semiconductor processing. It is a high-performance tool that enables manufacturability of advanced semiconductor devices. AMAT P-5000 is ideal for advanced 3D integrated devices, such as transistors, DRAMs, and others, due to its superior accuracy and cleanroom-compatible features. APPLIED MATERIALS P 5000 features a chamber made of stainless steel and quartz, with a horizontally mounted thermal radiation shield covering the walls, ceiling and floor. The design has a unique gas-tight and uniform insulation equipment, providing an efficient way to control the environment and enabling precise analysis of device performance. AMAT / APPLIED MATERIALS P 5000 utilizes advanced thermal uniformity control, which ensures all processing parameters are kept within a constant range, allowing consistent device production. AMAT P5000 is constructed with a modular design and offers capabilities such as remote diagnostics and maintenance control, as well as recipe capabilities. This feature allows manufacturing engineers to store and recall recipes based on device processing requirements, allowing operations to be automated and streamlined. AMAT / APPLIED MATERIALS P-5000 also features an advanced safety package, ensuring safe and fault-free processing. It includes automatic shutoff valves for potentially hazardous gases, pressure sensor cuts and absence of oxygen sensor contacts, as well as low and high-pressure limits. In addition, AMAT P 5000 offers a sophisticated thermal management system. This unit distributes the heat evenly, ensuring a uniform temperature distribution: ensuring uniformity of processing parameters such as temperature, pressure, and others. It also features a variety of customizable cooling systems, providing a more efficient way of cooling the machine, and a faster cooldown time. P5000 also offers a variety of advanced process technologies, allowing it to process up to seven layers of material simultaneously. The tool is capable of utilizing spin coating, PVD, CVD, etching, ALD and other powerful processes, with total control of the inductive, radiative and thermal heat sources. Overall, APPLIED MATERIALS P5000 is a versatile and reliable reactor ideal for high-tech semiconductor processing. With its precision and safety features, it is a perfect fit for complex integrated device fabrication.
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