Used AMAT / APPLIED MATERIALS P5000 #9103460 for sale

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ID: 9103460
Wafer Size: 8"
Vintage: 1992
CVD TEOS plasma etcher, 8" SNNF (2) DXL PETEOS CVD chambers Dry pump: No 1992 vintage.
AMAT / APPLIED MATERIALS P5000 is a reactor designed to help customers produce advanced materials for a variety of applications with a high degree of quality and repeatability. This reactor was designed to allow for precise control and process variability, allowing it to process a wide variety of materials. The reactor offers a unique design that includes a cylindrical blank enclosure that houses multiple, multi-chamber chambers. This reactor has also been fitted with a vacuum jacket that houses the main reaction chamber. This jacket supplements a heated vacuum equipment, which helps ensure safe and efficient operation. Additionally, a temperature-controlled environment is created to process the material needed in order to develop specific products. AMAT P-5000 is also equipped with a variety of process monitoring and control systems. These systems include scanning electron microscopy, focused ion beam technology, superconducting magnets, and mass spectrometers. There is also a high resolution digital imaging system for improved data collection. In addition to the advanced equipment, APPLIED MATERIALS P 5000 also has an automated control unit designed to precisely monitor and adjust the reactor's operations in order to optimize the processing capabilities. This machine allows for precise adjustments of the process parameters, ensuring that the products developed are of the highest quality and repeatability. AMAT P 5000 reactor is designed to help customers develop advanced materials with maximum control and minimal waste. This reactor offers a variety of features and functions that allow its users to efficiently process the materials needed for their specific products. Its advanced process monitoring and control systems ensure that the product results are consistent, making it the ideal tool for any type of material processing.
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