Used AMAT / APPLIED MATERIALS P5000 #9103464 for sale

AMAT / APPLIED MATERIALS P5000 reactor is designed for flexible ion implant and ion beam deposition processing of semiconductor substrates. It is capable of achieving high-precision processing for next-generation semiconductor devices. AMAT P-5000 is engineered to be modular and highly-customizable to enable customers to tailor their ion implant and ion beam deposition processes to the specific requirements of their wafers. The equipment features two chambers and a chamber configuration that can support up to four wafers in its largest configuration. The chambers are operated by independent vacuums and each has its own separate, sealed environment. The first chamber of APPLIED MATERIALS P 5000 houses the ion source, the reactor chamber, the mass spectrometer system and the source selection vacuum unit. The ion source is a cylindrical diffusion vessel with a fusion power source. It provides a wide range of energies and launching geometries to suit a variety of wafer-processing operations such as doping, doping transport and doping diode confinement. The reactor chamber of AMAT P5000 is fitted with a floating magnetic ring and adjustable anode plates, providing uniform ion-beam bombarding conditions and a very low background current. The mass spectrometer machine of APPLIED MATERIALS P5000 is designed for the accurate identification of impurity species and for the fine-tuning of implant and deposition parameters. The second chamber of P 5000 houses the process control and data acquisition computer, which is designed to provide full closed-loop control of the ion implant and ion beam deposition processes. The tool features an advanced user-friendly graphical user interface that allows for quick and easy control with minimal configuration. P-5000 is capable of providing full control over the concentrations of all species present in the process chamber and of controlling the beam current, ion current, energy, and stochiometry of the resulting beam. The asset is also able to achieve repeatable results with nano-scale accuracy. The overall design of AMAT P 5000 makes it an invaluable tool for the development of high-performance wafer processing technologies. The modular nature of the model, combined with its high-precision microprocessing capabilities, make it a powerful tool that can be tailored to the needs of almost any substrate processing task. By leveraging the design and capabilities of AMAT / APPLIED MATERIALS P 5000, process engineers can achieve high-precision results with unprecedented efficiency and flexibility.