Used AMAT / APPLIED MATERIALS P5000 #9106188 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a high-performance, reliable reactor used in semiconductor fabs (fabrication facilities) to deposit thin films on substrates. It is designed to serve multiple applications, including physical vapor deposition (PVD), chemical vapor deposition (CVD), and electrochemical deposition. The reactor uses a dual-zone, diffusion-bonded bell jar chamber design to provide excellent temperature uniformity and ensure process results that have consistently high yields, throughput, and quality. AMAT P-5000 has an innovative dual-zone, diffusion-bonded bell jar that can provide high performance deposition, accommodates a variety of deposition chemistry, and offers consistent thermal management. Dual-zone diffusion-bonded bell jars utilize the flow of a pressurized carrier gas through diffusion bonding baffles to improve temperature and uniformity, reduce front-to-back temperature gradients in the chamber, prevent outgassing and provide uniform distribution of the process gases throughout the chamber. The advanced bell jar chamber design ensures that the process uniformly coats each substrate, regardless of shape or thickness. APPLIED MATERIALS P 5000 boasts a powerful process control system that allows users to tailor the reactors' performance to specific applications while providing a high degree of process control. The intuitive software interface is designed to provide accurate deposition recipes, real-time monitoring and control, and efficient material flow. Through an integrated control platform, APPLIED MATERIALS P5000 offers detailed diagnostics, allowing engineers to track and analyze the reactors' performance. The system can generate custom reports and provide the necessary data for process optimization. AMAT P 5000 is equipped with an advanced control system, enabling users to easily control process parameters such as temperature, pressure, and deposition rate. A variety of deposition sources are available for both oxide and nitride applications, enabling engineers to tailor the reactor for a wide range of applications. Automated process recipes can be used for repeatable and repeatable results, and the advanced diagnostics provide specific information about the process to ensure optimal performance and yields. APPLIED MATERIALS P-5000 is the ideal choice for a multitude of applications, from PVD to CVD and electrochemical deposition, on both thick and thin wafers. With its effective temperature control and diagnostic capabilities, P-5000 is able to outperform competitors while guaranteeing process repeatability and yields.