Used AMAT / APPLIED MATERIALS P5000 #9112922 for sale

AMAT / APPLIED MATERIALS P5000 is a single-wafer processing reactor used for research, development and small batch production in the semiconductor industry. It is an ultra-high vacuums (UHV) system suitable for filter and deposition processes used to fabricate semiconductor devices and compound materials. AMAT P-5000 is controlled through an electronic control unit (ECU) and connected to a personal computer (PC) via an IEEE-488 bus. The ECU manages and operates the different components of the reactor. APPLIED MATERIALS P 5000 includes a process chamber, an upper and lower electrode, an Electrostatic Chuck (ESC) and a set of triboelectrically embedded Gas Delivery Subsystem (GDS) needles. The process chamber is a vacuum chamber that can reach pressures of 1E-7 torr or lower. A set of four concentric Inner Rings Disc allows for an even distribution of heat inside the reactor. AMAT / APPLIED MATERIALS P-5000 allows for a variety of deposition processes, such as ALD, PECVD and sputtering, using the parameters of electron and gas flow to adjust the reactant doses. The upper and lower electrodes can reach temperatures up to 1000°C and are charged using an ESC. The ESC is made of Triboelectric material and is designed to charge the wafer with a uniform electrical potential. The charging is adjustable depending on the process needs. The wafer is fixed and centered utilizing a four-point contact mechanism. The GDS needles are responsible for delivering controlled amounts of gases into the process chamber. For example, if AMAT P5000 is being used for a deposition reaction, typically three gases will be delivered in required doses into the reactor, a precursor, an oxygen species, and a carrier gas. The GDS needles can be programmed to modify the reactant doses during processing, allowing for complex processes that require fine-tuning of the reactants. In conclusion, APPLIED MATERIALS P-5000 is a single-wafer processing reactor used for research, development and small batch production in the semiconductor industry. It is an ultra-high vacuums system suitable for filter and deposition processes and is capable of delivering controlled amounts of gases with adjustable reactant doses. It is controlled via an ECU with adjustable parameters for deposition processes, and has an upper and lower electrode that can reach Operating Temperatures up to 1000°C.