Used AMAT / APPLIED MATERIALS P5000 #9114062 for sale

AMAT / APPLIED MATERIALS P5000 is a state-of-the-art etch/deposition tool. It is designed for patterned wafer etching and for dual-chamber deposition. It is used for resist stripping, surface pre-cleaning, plasma etching, and physical vapor deposition (PVD). AMAT P-5000 is a high productivity tool that is renowned for its high throughput, low cost per wafer, and excellent process control. The main chamber of APPLIED MATERIALS P 5000 is a versatile and powerful dry etching equipment designed for use with reactive and non-reactive gases. It utilizes multiple etch chemistries for a variety of process applications. APPLIED MATERIALS P-5000 has an efficient magnetic filter system that minimizes debris, dust particles, and particulate. This results in cleaner, more uniform etch results. AMAT / APPLIED MATERIALS P 5000 is highly configurable and can be programmed with specific process recipes to achieve consistent, controllable results. In addition to the etching chamber, AMAT P5000 features a physical vapor deposition (PVD) chamber, which can deposit metal films or other material surfaces onto a wafer or other substrate. The PVD chamber has two independently controllable sources: a RF source, which can deposit metal films, and a DC source, which can deposit silicon films.P 5000 is equipped with an advanced process automation unit, which enables it to perform difficult and complex measurements at placement accuracy of 0.00005 Inches. This machine allows for tight process control and uniform etch results. AMAT P 5000 is a powerful and capable tool for wafer etching and deposition applications. It has a wide range of process capabilities, which makes it ideal for a variety of applications. From the etching chamber and PVD chamber to the advanced process automation, APPLIED MATERIALS P5000 has all the features necessary for high productivity and excellent process control.