Used AMAT / APPLIED MATERIALS P5000 #9114541 for sale

ID: 9114541
Metal etcher (2) MXP, (1) ASP.
AMAT / APPLIED MATERIALS P5000 is a reactor designed for semiconductor process applications. It is an insulating chamber that contains an array of high performance components. AMAT P-5000 is considered an advanced reactor due to its optimized capability and versatility. It is composed of three main components: the chamber, the heater element, and the gas manifold. The chamber features a stable and reliable base, which provides a secure foundation for the other components. The high-performance heater element reaches higher temperatures for quick and effective processes. The gas manifold provides the short-term storage of process gases during the operation of the reactor, as well as for the escape of byproducts. The components of APPLIED MATERIALS P 5000 render the reactor very energy efficient. It achieves a very high level of energy efficiency by utilizing features such as its high performance heater, its programmable logic refrigeration control, and its special gas mixture regulation valve. This results in substantial energy savings, while simultaneously providing optimal process results. AMAT P5000 also offers quick process cycle times and a high level of stability. This is made possible through its superior venting system, its advanced onboard controller, and its adjustable flow rate. These features allow for better accuracy and precision, ensuring repeatable results and process control. Overall, P5000 is an advanced and reliable reactor. The components of this reactor make it highly energy efficient, while enabling repeatable process results. Its features provide quick process cycles with high levels of stability. This versatility and versatility make AMAT / APPLIED MATERIALS P-5000 an ideal choice for semiconductor process applications.
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