Used AMAT / APPLIED MATERIALS P5000 #9116159 for sale

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ID: 9116159
Wafer Size: 6", 8"
Vintage: 1994
Etcher, 6" (3) MXP Poly chambers A: MXP B: MXP D: MXP+ 1994 vintage.
AMAT / APPLIED MATERIALS P5000 is a leading-edge semiconductor reactor used in etching and deposition processes. This reactor provides reliable equipment performance, cost-effective operation and process control enabling quick delivery of new products. AMAT P-5000 reactor has a 13.56MHz generator for both high-power RF sputtering as well as high-density inductively coupled plasma (ICP) processes. The process chamber is designed for efficient gas mixing, precise flow control and precise gas concentration maintenance. Vacuum levels are maintained through a diaphragm mechanical forepump. APPLIED MATERIALS P 5000 reactor also employs a vacuum gate valve for precise trapezoidal pressure regulations. In addition to its high performance, AMAT / APPLIED MATERIALS P 5000 reactor provides cost savings with its unique design which maximizes the ratio of installed ion flux density per unit surface area with optimally used hardware. The power applied in the process is highly efficient, consequently bringing in cost benefits since less operational power is required. APPLIED MATERIALS P-5000 features a combination of pulsed and continuous DC bias sources with precise pulse width, frequency and amplitude control. This makes it possible to optimize etch and deposition recipes, ensuring excellent yield and quality. P-5000 provides enhanced film properties such as uniformity, density and thickness, with its precise temperature and pressure control. Sophisticated process design, precise control of film growth and improved throughput are some of the key benefits of AMAT / APPLIED MATERIALS P-5000 reactor. The reactor has an ion source with separate emitters for different mate rials and layers. In addition, this reactor has a gas injection system that ensures precise gas distribution and pressure control on different levels within the chamber. AMAT P5000 reactor further enables high-speed manufacturing processes with a fully digital low-voltage DC, alternating current (AC) and sputter power supplies. By providing reliable equipment performance and cost-effective operation, P 5000 is a popular choice for semiconductor fabrication.
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