Used AMAT / APPLIED MATERIALS P5000 #9134767 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced, integrated single wafer reactor designed for advanced semiconductor device production. Featuring an innovative planar architecture, AMAT P-5000 is capable of advanced deposition processes such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). This makes it perfect for creating thin films and nanostructures for a wide range of semiconductor applications. The system is composed of four main components. The first is the process chamber, which includes a number of gas lines and a top-down vapor generator. Inside, the vapor generator heats materials in the chamber while gas lines inject the vaporised materials onto the substrate. The chamber is sealed with an N2 purge, preventing material contamination and reducing unwanted reactions. The second component of APPLIED MATERIALS P 5000 is the plasma generator. This component creates the desired reaction in the chamber by using Radio Frequency (RF) energy to excite the molecules in the chamber. This process helps to reduce defects and impurities, which are crucial for optimizing device performance. The third component of APPLIED MATERIALS P5000 is the platform system, which enables precise control of the deposition process. This includes a number of modules that control the pressure, temperature, and gas flow in the process chamber. It also includes a number of sensors to monitor the process, allowing for real-time tuning to ensure optimal performance. Finally, the fourth component is the automation system, which ensures the entire deposition process is controlled according to the intended recipe. This allows for a high level of repeatability, which is crucial for engineers creating complex device structures. In summary, P 5000 is an advanced, integrated single wafer reactor designed to meet the demands of advanced semiconductor device production. With its planar architecture and comprehensive suite of components, AMAT P5000 is capable of creating thin films and nanostructures with high precision and repeatability.