Used AMAT / APPLIED MATERIALS P5000 #9153667 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an industry-leading etch equipment used to etch a variety of material wafers in the microelectronics, nano-electronics, data storage, and optoelectronics markets. It is part of a full suite of etching tools offered by AMAT, which are designed to provide the highest reliability, deepest etch rates, and widest process windows. AMAT P-5000 is designed for general purpose etching, including high-aspect-ratio etch, and can precisely create multi-level structures, allowing for the intricate structuring of the most complex integrated circuits. APPLIED MATERIALS P 5000 is capable of providing consistent etch profiles through a variety of different etch recipes, the most precise of which is with a plasma-assisted etching configuration. This configuration includes a vacuum chamber, an RF power supply, a process gas control unit, and an antennae or injection electrode. The atmospheric-pressure in the chamber is maintained with a mechanical pump and regulator, while the etching gas is fed into the chamber through a gas handling system. The microwave-generated plasma consists of ions, radicals and other activated species which create a highly charged environment that encourages etch rates on the exposed materials. APPLIED MATERIALS P-5000 is equipped with a Modulated Electron Cyclotron Resonance (MECR) patform which improves plasma uniformity, reduces etch time, and increases throughput. AMAT P 5000 is one of the most advanced etch systems available, offering a wide variety of recipes and high performance. P5000 is designed to produce sharp, deep etch profiles in a variety of materials, including silicon, silicon dioxide, silicon nitride, and photoresists. With its precise control of etch rates, APPLIED MATERIALS P5000 enables faster lithography and micromachining processes. AMAT / APPLIED MATERIALS P 5000 features an advanced photoionization control unit which ensures fast response to control errors and maintains highly accurate process outcomes. Additionally, P 5000 is equipped with real-time performance monitoring and diagnostics tools which facilitate process optimization and monitoring. In conclusion, AMAT / APPLIED MATERIALS P-5000 reactor is an advanced etch machine designed to produce deep, precise etch profiles with adjustable process parameters, high etch rates, excellent uniformity, and fast process times.