Used AMAT / APPLIED MATERIALS P5000 #9153668 for sale

AMAT / APPLIED MATERIALS P5000 is a plasma-enhanced chemical vapor deposition (PECVD) reactor, used to deposit thin films of various compositions to create semiconductor, optical and biomedical devices. This versatile equipment can deposit a variety of oxide, nitride, and carbide thin films, in a range of temperatures from low to high. The reactor has an enclosed chamber filled with a working gas, such as a reactive gas, to create the deposition process, and the materials to be deposited. The chamber is surrounded by a spin-on wafer holder, which can be rotated to allow for uniform coating of the target material over the wafer surface. Inside the chamber are two substrates for wafer growth, as well as electrodes and capacitors to facilitate the plasma formation necessary for stable film deposition. A microwave power supply is used to generate the plasmas, resulting in fast and efficient deposition. The chamber pressure is adjustable, and the temperature and deposition time can be adjusted to achieve desired film properties. An RF field is also used to control the deposition rate, providing the ability to deposit a range of thickness of the film material. The system is also equipped with an analyzer set-up, which is used to measure the parameters obtained during deposition. AMAT P-5000 is a reliable and efficient reactor for depositing thin films of varied materials. With its adjustable settings, the unit allows for optimal film deposition, even in extremely challenging applications. In addition, the machine is fairly inexpensive and is compact, making it an ideal choice for commercial and industrial use. As such, APPLIED MATERIALS P 5000 is a popular choice among manufacturers and other professionals in the semiconductor and optics industries, and a proven workhorse in the development of various medical, aerospace, and electronics components.