Used AMAT / APPLIED MATERIALS P5000 #9153669 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced deposition equipment manufactured by AMAT, a company well-known for selling and supporting equipment for research and the semiconductor industry. This type of reactor is used for high-precision sputtering of thin films for applications such as lithography and dielectric isolation, and is a leading example of a state-of-the-art thin-film deposition system. This particular deposition unit features a multi-arm process chamber with a 2-segment pumping machine and an integrated on-axis region. It is made up of a high-grade stainless-steel vacuum chamber and can hold nine process arms, each designed to handle hermetic wafer carriers. The shield panels found inside the chamber are made up of an aluminum backbone with carbon fiber composite sidewalls. The process control software enables the user to control the electrical, mechanical and chemical states of the chamber and its components in order to achieve the desired process results. AMAT P-5000 is equipped with two inbuilt power supplies for sputtering and provides complete control over target current. It supports a range of sputter materials from metals to alloys, organics, and even oxides. In order to optimize the deposition process, the tool can detect any impurities present in the target material and provides a real-time display of target current and pressure. This ensures that the material is sputtered with maximum uniformity, thereby allowing for high-precision thin-film deposition. The asset also has the ability to measure wafer temperature, allowing the user to optimize deposition conditions. This can also be used to ensure that the substrate temperature is below the melting point of the desired material. APPLIED MATERIALS P 5000 is outfitted with various other features to ensure effective target utilization. For example, it includes an advanced target management model to automatically exclude used target material and avoid damage to the equipment and its components. Furthermore, its adjustable ion source provides improved deposition results and allows for better uniformity between dies. Finally, its unique air filtration system prevents dirt and dust particles from entering the vacuum chamber, ensuring better process stability and uniformity. Overall, P5000 is a high-quality, state-of-the-art thin-film deposition unit that provides superior precision and process control. It is designed to handle a wide variety of materials and its features help to optimize the deposition process, making it perfect for research and industrial applications alike.