Used AMAT / APPLIED MATERIALS P5000 #9160448 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a production tool specifically designed for the deposition and etching processes associated with the manufacture of semiconductor material. It allows for the efficient production of thin films of various materials on both single and multi-layer substrates. AMAT P-5000 Reactor is a versatile tool which can be used in a variety of processes, such as plasma-enhanced oxidation; physical vapor deposition; chemical vapor deposition; etching; electrode manufacturing; alloy growth; catalyst production; thin film deposition; and research & development. Its plasma-supported processes are conducted in a vertical, batch-mode reactor environment with a heated vacuum chamber, as well as a series of vertically integrated wafer stages and support subsystems. APPLIED MATERIALS P 5000 Reactor is equipped with a top-mounted, high-power RF plasma source and a separate, in-situ, diagnostics source. This combination provides the flexibility to obtain precise physical parameters - temperature, gas flow, pressure, and current - necessary for reliable process results. P-5000 Reactor features a very strong and durable quartz bell jar, and its components are built for a wide range of process conditions. Additionally, the reactor can be rotated and tilted for easier handling. This special feature allows APPLIED MATERIALS P-5000 Reactor to be used for an array of deposition applications, including dielectric, resist, copper and adhesion enhancement processing. The reactor is further equipped with a specially designed baffle system for precise control of the gas distribution inside the chamber. This baffle system improves the deposition uniformity, and helps reduce the total thickness and mask distortions of the thin film layers. AMAT P5000 Reactor also includes a unique computer control system which allows the user to select and control various process parameters. This software package helps to facilitate wafer loading/unloading, sample characterization and analysis, process scheduling, and calibration of deposition conditions. In short, APPLIED MATERIALS P5000 Reactor is an advanced deposition tool designed to facilitate the precise production of thin films and multi-layer structures. It is an efficient, versatile tool that offers consistent, reliable results.