Used AMAT / APPLIED MATERIALS P5000 #9166747 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a large-scale, multi-chamber, process-capable, production-scale thin film deposition equipment. The reactor enables large-area deposition of thin films through its unique chamber design, which takes into account a range of film properties and customer needs. The reactor can be used to deposit a wide range of materials, such as metals, ceramics, polymers, and semiconductors.The system utilizes traditional physical vapor deposition (PVD), chemical vapor deposition (CVD), and plasma-enhanced chemical vapor deposition (PECVD) processes. Atmospheres range from high vacuum to high pressure. Heat sources are laser, electron beam, resistive and RF. AMAT P-5000 reactor utilizes a multi-level architecture to bring together multiple high-performance chambers, sources, and station integrated heating and cooling (IHC) systems. At the chamber level, the unit offers active joint alignment, allowing for precise placement of the deposition components relative to each other. At the source level, APPLIED MATERIALS P 5000 utilizes e-beam, ion beam, RF, and turbo-molecular pumps to ensure precise and uniform deposition of the target materials. At a precise level, the machine integrates digital controllers with a state-of-the-art liquid crystal digital user interface that enables the user to monitor the deposition process. For added stability, the tool includes a precision-aligned one-piece chamber assembly which ensures a precise, thermally uniform chamber for precise deposition. It also incorporates a real-time temperature monitoring asset that is designed to quickly detect any changes in the chamber temperature. AMAT / APPLIED MATERIALS P-5000 reactor is also designed to be easily upgradable to meet the changing needs of the customer. The model's modular construction allows for easy installation and adjustments to the chamber and sources. The equipment also supports a range of film applications with its adjustable process parameters, allowing for greater flexibility. Overall, APPLIED MATERIALS P5000 reactor is an effective and reliable production-scale thin film deposition system. It offers a wide range of film deposition capabilities and is upgradable to help meet the changing needs of its users. By capitalizing on its multifunctional design and features, P5000 reactor is an attractive tool for thin film processing at a production scale.