Used AMAT / APPLIED MATERIALS P5000 #9172854 for sale

AMAT / APPLIED MATERIALS P5000 is a plasma-enabled chemical vapor deposition (CVD) reactor developed by AMAT, Inc. The reactor utilizes a range of distinct magnetic fields, RF frequencies and plasma sources to reach a wide range of processing temperatures and levels of flux, allowing for higher deposition rates, higher process yields and the ability to process large wafers in a single batch. Processes that can be carried out with AMAT P-5000 include epitaxy, deposition of high-performance dielectric layers, diamond-like carbon deposition, photoresist ashing, etching of aluminum and silicon, and various etchant cleaning processes. APPLIED MATERIALS P 5000 features a flexible environment that enables the effective processing of materials with a wide range of combinations of deposition temperatures, fluxes, chamber configurations, and gasses. Building on the capabilities of its predecessor, AMAT / APPLIED MATERIALS P 5000 also features system scalability with the ability to adjust to more complex depositions. The system also features improved source life with larger source ranges and improved integrated oven sensors for control of process-specific parameters. APPLIED MATERIALS P5000 reactor is available in three chamber configurations: Single Chamber Configuration (SC), Double Chamber Configuration (DC) and Triple Chamber Configuration (TC). The chamber compartment has a stainless steel construction with replaceable gold seed evaporator modules for improved uniformity and fully programmable gas distribution for flexibility in deposition chemistries. A range of sources and components for each configuration help to ensure uniform and consistent material deposition even on large substrate sizes. P 5000 can be used to deposit a variety of materials including as aluminium, titanium, nitroute-doped aluminium, chromium, antimony, tungsten, and silicon dioxide. The ability to precisely control process parameters, uniform deposition, and high throughput enables high deposition quality, minimized cost of non-conformance (CNC) and optimum results in short processing times. The improved energy-efficient cooling technology of AMAT / APPLIED MATERIALS P-5000 enables a larger, more uniform deposition area with improved flatness. Additionally, the system features components that have been designed to reduce maintenance and downtime by automating common tasks, including the automatic exchange of sources and pumps, improved RF and bias matching, and automatic end-of-run sensor calibration. Overall, P5000 is an advanced, versatile plasma-enabled CVD reactor that is built for the deposition of a variety of materials for a wide range of processing requirements. It is an ideal choice for achieving high-quality, high-yield results in a wide variety of processes.