Used AMAT / APPLIED MATERIALS P5000 #9177255 for sale
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ID: 9177255
Etcher
(2) Chambers
Cleanroom: 4", 5", 6" robot
(15) Slot storage elevators
IPT P/N: 10A0207-5 Rev D
Mini SBC reset
(2) Analog inputs
(2) Analog outputs
VGA Video
(3) Program run stepper conts
(5) DI / DO +24 V HB
(3) LH Turbotronik NT 340 M
Magnetic bearing PCB V 2.0
(2) TC Gauges
Lambda LIS-31-12, 12 V +/-5%, 1.25 A @40 C
Carlton-bates WBPS-15-7 15+/- 5%, 7.0 A @40 C
Lambda LIS-71-15, 15 V +/- 5%, 5.0 A @40 C
Buffer I / O
AI MUX
(2) OPTO
(4) APPLIED MATERIALS Chopper drives
APPLIED MATERIALS 0850-00088 Wall mount display panel
Includes components:
PC Endpoint:
Part no: 0010-36543
REV F
471-KM
Chamber A:
APPLIED MATERIALS RF Match:
P/N: 0010-33566
Chamber C:
APPLIED MATERIALS RF Match:
P/N: 0010-33566R
Chamber D:
APPLIED MATERIALS RF Match:
P/N: 0010-33566R
LUXTRON 1104 Monochromator
Options: 5001-1104-20-00
(3) VAT 0300X-MA24-1006 / 0490 A-273567 Throttle valves
(3) 1 Torr pressure transducer manometers
Circuit breaker panel
(2) Frame side panels
(3) Remote generator I / O cables
Remote NESLAB I / O cable
(3) Remote pump start cables
(3) Remote vacuum I / O signal cable
(3) RF Generator cables
(3) RF Match I / O cables
Robot alignment controller.
AMAT / APPLIED MATERIALS P5000 process chamber is a full featured, high performance reactor. Designed for maximum deposition rate, uniformity, and process control capability, this reactor includes an integrated InLine Direct Measurement (IDM) equipment for N2 or O2 gas flow control, along with a proven plasma source, advanced electron cyclotron resonance technology, hot-wire damage protection, and superior air locking for extremely long life. With its large process area of 254mm x 304mm, AMAT P-5000 is ideal for processing a variety of substrate types in large and small scale productions. The system includes a 1-bar vacuum source with a combination of advanced, sophisticated oil-free pumping systems, including a molecular drag pump and a turbo molecular pump. This combination provides an exceptionally large pumping speed of up to 200,000 litres per second, allowing for quick, reliable process cycles. The large process area is designed to enable maximum throughput and boost production wax in a single run. The unit also features an advanced DC and RF power supplies, allowing for smooth, reliable deposition of metals, oxides, polysilicon, dielectrics and nitrides. Its electron cyclotron resonance technology is highly efficient and ensures uniform deposition conditions over the entire wafer area. A unique two-step process is used to ensure high deposition rates with minimal gas and power consumption. Safety features such as hot-wire protection, short circuit protection, low pressure protection, and over-voltage protection provide added assurance of a safe process. APPLIED MATERIALS P 5000 is also compatible with a wide range of process gases and flammable storage tanks, and a built-in argon feeder allows for easy process adjustments without requiring external gas supplies. This machine also supports a variety of optional accessories, including ion sources and ion chambers, degas systems, spectrum analysers and wafer lift mechanisms, as well as an intuitive control software which is extremely easy to use. In conclusion, APPLIED MATERIALS P5000 process chamber is an ideal choice for efficient and reliable deposition of metals, oxides, polysilicon, dielectrics, and nitrides. Its high throughput capabilities, combined with advanced features such as the ECR technology and built-in argon feeder, make it an excellent choice for any application requiring smooth, reliable process cycles with reliable results.
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