Used AMAT / APPLIED MATERIALS P5000 #9178860 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is an industry-leading deposition system designed to enable high-quality, advanced techniques for thin film deposition and wafer processing. Featuring an ergonomic design and low-maintenance operation, AMAT P-5000 Reactor is an ideal tool for depositing homogeneous thin films onto a variety of substrates including silicon, gallium arsenide, indium, and others. APPLIED MATERIALS P 5000 features a unique and patented batch-style architecture. This first-of-its-kind design allows for up to five wafers to be processed at one time and offers superior uniformity, ensuring uniform deposition thickness and physical characteristics across the wafers. APPLIED MATERIALS P5000 also features a modular design which enables the configuration of up to four independent chambers, and up to four deposition sources can be combined in a single chamber. AMAT P 5000's design and construction ensures maximum process throughput with reliable and repeatable results. Dual-Robot and Dual-source configuration options provide an additional level of flexibility, allowing multiple chamber processing in accelerated times. By incorporating precision temperature and pressure control into the system, AMAT / APPLIED MATERIALS P 5000 allows for ideal and consistent thin film deposition of even the most difficult materials. AMAT also offers advanced metrology capabilities, allowing for process monitoring and control throughout the process. This enhanced monitoring, combined with extensive safety features, enable process security and optimization. Overall, P 5000 Reactor is able to process a wide variety of thin film depositions, from thin CDs to complex stacks. With its versatile architecture, reliable and consistent results, and enhanced safety features, AMAT P5000 is an ideal solution for any thin film deposition requirement.