Used AMAT / APPLIED MATERIALS P5000 #9179591 for sale

AMAT / APPLIED MATERIALS P5000 is a plasma-enhanced chemical vapor deposition (PECVD) reactor. It is an industrial-grade, high-throughput tool used for thin film deposition applications. AMAT P-5000 provides an ideal environment for the deposition of thin layers of materials such as semiconductors, oxides, and metals in the production of opto-electronic, data storage and microelectronic devices. APPLIED MATERIALS P 5000 utilizes a double-staged conduit that houses a process chamber and reaction chamber. The process chamber contains the substrate and can be heated up to a maximum temperature of 500°C. The reaction chamber houses the plasma source and control electronics responsible for the plasma generation and monitoring. In the reaction chamber, the plasma is created through an RF (radio-frequency) source and maintained by three gas sources - nitrogen, argon and hydrogen. The substrate experiences a bombardment of energetic ions that act as an etch or deposition agent to form thin film layers on the substrate. The 12-step process cycle means substrates can be processed in a matter of hours and with a high degree of repeatability. AMAT / APPLIED MATERIALS P 5000 offers easy tool setup for repeatable and consistent results, and flexibility via user-friendly software. It is designed and manufactured to meet the specific process requirements for a variety of film deposition processes, with a wide selection of recipes and process chemistries compatible. P 5000 is a reliable deposition system that can be used in a variety of applications, from microelectronics to data storage to photovoltaic cells and beyond. It is designed to allow rapid and efficient production of first-time-right integrated circuits with a high level of quality assurance. It also offers process control, automation, and data collection systems to enable consistent and accurate deposition of very thin uniform films at low temperatures. Overall, AMAT P 5000 is an industrial-grade, high-throughput PECVD reactor which offers great flexibility, efficiency, consistency and reliability. With its advanced features and high degree of process control, it can help to create high-quality integrated circuits with a great degree of accuracy and yield.