Used AMAT / APPLIED MATERIALS P5000 #9180686 for sale
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ID: 9180686
PECVD System
Spare parts:
Qty P/N Description
Cabinet 1: Shelf 1
(2) 0020-10752 Pumping plate 4,5,6" silane/nitride
(0) - 5 Hole pumping ring
(5) 0020-09316 Plate, blocker 150 MM teos
(1) - Plate, blocker 150 MM Silane
(11) 0020-10771 Perf blate, 150 MM Oxide
(4) 0020-10119 Showerhead CVD nitride rounded shoulder
(1) 0020-10119 Showerhead CVD nitride beveled shoulder
(3) 0020-10941 Isolater, Teflon ring (Nitride)
(2) 0020-10941 Isolater, Teflon ring (TEOS)
Shelf 2:
(3) 0020-10059 Ring, wafer lift
(10) 3700-02455 I/O Door oring
(0) 0150-09389 Cable assy,heater liquid source
(1) 3700-01033 Manifold output plate
(3) AS-568A K121 Teos iso valve oring
(6) AS-568A K030 Teos iso valve oring
(1) FS-V11 Motion sensor
(2) FS-V12 Motion sensor
(1) FS-V31C Motion sensor
(1) FU-95 Motion sensor
(1) - Delrin, focus ring
(1) 0020-09885 Isolater, delrin ring
(9) 0015-09232 Adjustment screw
(1) - Ceramic, focus ring
(3) 0010-60011 Susceptor assy(teos)
(5) 0200-09021 Shield, 150mm
(0) 0200-10193 Nitride shield
(1) 0020-09604 Single cfg(gas block)
Shelf 3:
(5) 0200-09158 Heater window
(5) 0150-09097 Cable assembly for heater lamp
(17) 3690-03638 Set screw for lamp modules
(9) 3790-01219 Insulators for lamp modules
(277) 1001820 Ushio 1000w lamp
Shelf 4:
(3) 0010-09341 Wafer lift
(1) 0010- 30029 (Primex) p chuck lift rebuild
(1) 0010-09341 Wafer lift
(4) 0010-09340 Susceptor lift
(1) 0010-09340 Susceptor lift
(1) 0010-09750 Rf match
Shelf 5:
(1) 0140-09244 Teos ampule
(1) 0010-09237 Heater module,basic
(4) 3700-01739 Oring
(1) 3700-01120 Oring kit for robot
(2) Type 0536 TC
(4) 167cv75 Oring
(1) D009510059 Oring
(3) 275V75 Ceramic tube o-ring
(3) 884V75 Oring
(1) 265V75 Oring
(9) 233V75 Oring
Misc lift parts
Cabinet 2: Shelf 1:
(2) 0200-09664 Window slit,al203
(3) 0020-09545 Filter, slit-window, cvd
(0) 0030-00195 Large face seal
(0) SS-SVCR4 Metering valve
(9) - Teos board connector female 3 pin
(8) - Teos board connector male 3 pin
(7) 0020-30533 Screw susceptor
(1) 0240-76545 Isolation valve rebuild kit kalrez
(200) - 6-32 x 5/16 skt ni plated
(200) - 4-40 x 5/8 skt ni plated
(4) 3630-01017 E clips
(2) 0190-09454 Endpoint detector
(30) 0015-09329 Screw mach btn hd 6-32 x 3/8 hex skt sst
Shelf 2:
(0) SS-BNV51-C Nupro valve vcr f-f
(1) SS-4TF-VCR-40 Nupro bottom actuator
(2) 0020-10921 Spacer wafer/susceptor lift
(12) - Spacer wafer/susceptor lift
(1) 0200-09035 Solid state hard drive
(200) 3690-01092 Scrcap skt hd 10-32 x 3/8l hex skt sst
(4) 3880-01215 Flat washer for pumping plate assy
(48) 3690-01156 Blocker plate screws
(140) 3690-01083 4/40 screw for robot, doors, actuators
(2) 3880-01368 Wshr lkg split m10 7.9mmw x 2.2mmthk stl
(15) 0020-09843 Sleeve wafer lift pin
(19) 3690-01676 Screw mach shldr for ceramic shield on shower
(29) 0020-10722 Modified screw, perf plate, thin
(34) 0020-10721 Cover,screw,teflon thin perf plate
(0) 0020-10728 Clamp, shield 4,5,6"teos
(1) - Gas box oring kit
(5) 3880-01079 Wshr wave sprg .367od x .265id x .030fh
(2) 0015-76034 Mdfd cplg shaft jspdr 1/4 bore
(17) EV-SM24 Ev valves for hot box w/24" leads
(2) 0020-10482 Box,temp/level sensor
(2) 0190-13175 Light pens
Shelf 3:
(1) - Teos watlow controller
(4) 548201 Lid closed switch
(1) 4020-01061 Point of use filter
(6) 3300-01215 Ftg hose conn 1/16h 10-32m brs barb
(2) MCV-2 Check valve
(2) 0020-09882 Amorphous rf connectors
(1) 0010-09301 Cvd throttle valve
(5) 276V75 Oring
(5) 3700-01334 O-ring for gas box
(5) 3700-01329 Throttle valve assy o-ring
(1) 111V75 Oring
(6) 3700-01332 O-ring for gas box
(4) 3700-01739 Oring id 1.859 csd .139 viton 75duro brn
(1) 0020-09881 Adaptor manifold
(8) 109v75 O-ring
(4) 3780-01090 Spring for wafer lift or susceptor
(0) 0015-09056 Lift bellows
(3) 3080-01030 Timing belt for motor
(2) 0015-09055 Bellows assy susceptorhollow
(2) 0200-35525 Resistor, ceramic, near-net shape
(6) 0200-09025 Tube gas feed, quartz 6mmx6.38
Shelf 4:
(4) - Lift actuator
(5) 0090-09006 Slit valve actuator
(2) 0010-09022 Slit valve assy
(1) FC-7700CD 300 Sccm silane
(1) FC-7800 50 Sccm silane
(1) UFM-1100 1 Slm he
(1) FC7700CD 1 Slm o2
(1) FC7700CD 1 Slm c2f6
(0) FC7700CD 500 Sccm he
(1) - Universal chamber integrated pumping stack
(2) 0010-09174 Assy thrvl valve 200mm, downstr,vi oring
(1) 0010-09146 Assy,sil.thrvlv 100-125-150mm,downstr, v
(1) 0100-09094 Box heater control brd
(2) - Misc drive motors
Shelf 5:
(1) 0010-70395 Robot extension motor
(1) 0010-70394 Assy,rotation motor, 5000 robot
(1) - Monitor base assy.
AMAT / APPLIED MATERIALS P5000 is a high-powered plasma-based etching and deposition equipment. It is an advanced, open-chamber tool designed for use in semiconductor production process. The system features a three-module chamber assembly and a high-speed, computer-controlled delivery unit. AMAT P-5000 enables a variety of etching and deposition chemistries while providing maximum processing throughput. The machine's chamber is designed and manufactured to offer extremely high throughput and high uniformity via uniform-floating induction and matched substrate heating. Its small footprint makes it an easily integrated tool in the etching process. The high-pressure chamber is capable of generating 10 mTorr while the standard pumping station is maintained at 50 mTorr. APPLIED MATERIALS P 5000 is driven by AMAT high-performance AMAT P 5000 process controller. This is a customizable supervisory tool that enables exact control over the deposition parameters and recipe execution. The asset also allows for accurate program adjustments for various depositions. The automated load-lock model of AMAT P5000 makes it easy to work with multiple substrates at the same time for higher production efficiency. P5000 has integral load-lock equipment, allowing for rapid material transfer without the need for manual material exchange. The system also includes high-speed robotic manipulation hardware, allowing for automated loading and unloading of materials from the chamber. APPLIED MATERIALS P-5000 supports a range of etching and deposition chemistries, while providing maximum etching uniformity, both within and between wafers. The unit also features advanced gas mixing and delivery, allowing for precise regulation of the deposition and etching parameters. The machine's reactors are capable of generating plasma with frequencies ranging from 250 kHz to 1000 kHz. The fully automated P 5000 also includes in-situ monitoring and recipe adjustments for rapid process optimization. This allows for immediate wafer-level analysis of in-process films, enabling manufacturers to optimize their processes on the fly. AMAT / APPLIED MATERIALS P 5000 is an advanced plasma-based, open-chamber tool designed to enable high-volume semiconductor production. It has a small footprint and superior deposition uniformity and throughput. With an automated load-lock asset and advanced monitoring and adjustment features, AMAT / APPLIED MATERIALS P-5000 enables the highest levels of production efficiency and performance.
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