Used AMAT / APPLIED MATERIALS P5000 #9181901 for sale

AMAT / APPLIED MATERIALS P5000 is a chemical vapor deposition (CVD) reactor designed for use in semiconductor and MEMS manufacturing processes. AMAT P-5000 is a high-throughput equipment designed to speed up wafer processing and minimize downtime, and features an easy-to-use GUI and advanced automation capabilities. APPLIED MATERIALS P 5000 CVD reactor consists of a vacuum chamber that is enclosed by a stainless steel shell, along with a substrate carrier for positioning the wafers inside the chemical deposition chamber. Inside the chamber is a substrate holder which is mounted to the ceiling and a gas inlet, which enables chemical vapor reactants to be introduced into the chamber. The chamber is further equipped with a dedicated heat exchanger system, a vacuum pump, and a susceptor which provides the necessary thermal stability and uniformity needed to ensure precise processing results. During chemical deposition processes, a computer-controlled unit regulates the pressure, temperature and flow of gases inside the machine, so that the desired material is deposited onto the substrate. The vacuum tool creates a low-pressure environment in the chamber that enables successful and efficient deposition of chemical species. APPLIED MATERIALS P5000 is designed to be extensible, meaning that the asset can be configured and upgraded for specific needs. For instance, AMAT offers the reactor in several models, each of which can be equipped with options and accessories that best meet the needs of the customer's application. The model is also designed for safety purposes with interlocks that shut down the equipment if certain conditions are not met. In conclusion, P 5000 is a cutting-edge CVD reactor designed specifically for use in semiconductor and MEMS manufacturing processes. Its efficient design and customizable features make it an ideal solution for the demanding needs of these applications.