Used AMAT / APPLIED MATERIALS P5000 #9184961 for sale

AMAT / APPLIED MATERIALS P5000 reactor is a material deposition and annealing equipment designed to enable industrial-scale deposition and annealing of advanced materials. AMAT P-5000 reactor is a vacuum chamber-type, thermally-isolated, high-temperature, ultrahigh vacuum special process system used to deposit and anneal a wide variety of materials including metals, alloys, and non-metals. APPLIED MATERIALS P 5000 reactor's design enables processing of up to four material layers simultaneously, with automated, repeatable results for more efficient material deposition and annealing. P5000 reactor's chamber is designed to minimize heat leakage from the heated substrate and from the interior of the vacuum chamber, and is equipped with a high-efficiency diffusion pump to maintain a vacuum pressure in the range from low-10^-1 to mid-10^-6 torr. The chamber is made of stainless steel, equipped with view ports, vacuum ports, and a variety of sample holder and susceptor plates for holding various substrates and samples. In addition to the diffusion pump, the chamber also includes a turbo-molecular pump, a gas storage tank supplying a variety of gases and controlled by a closed-loop pressure controller. P 5000 reactor is ideal for producing silicides, oxides, nitrides, and other highly sophisticated materials and alloys through a range of deposition techniques, including chemical vapor deposition (CVD), physical vapor deposition (PVD), plating, and CVD/PVD/plating hybrid techniques. The annealing process can also be done on-site in AMAT P5000. AMAT / APPLIED MATERIALS P 5000 also enables the fabrication of multi-layered and stacked materials, such as inorganic dielectric materials and transparent conductors, with multiple steps and substrates. P-5000 offers accurate, repeatable results and can process different materials and layers simultaneously, with thicknesses up to 0.5 microns for each layer produced. In summary, AMAT / APPLIED MATERIALS P-5000 reactor is a specialized vacuum chamber unit designed for industrial-scale deposition and annealing of various materials. The machine enables the formation of silicides, oxides, nitrides, and other materials and alloys, with repeatable and automated results of up to four layers simultaneously and with layers of up to 0.5 microns thick. AMAT P 5000 offers an unbeatable combination of efficiency, accuracy, and scalability, making it an ideal choice for large-scale production of advanced materials.