Used AMAT / APPLIED MATERIALS P5000 #9185352 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance plasma-enhanced chemical vapor deposition (PECVD) reactor. This reactor is capable of producing a variety of thin-film coatings that can be used for a variety of applications. It is equipped with an innovative gas delivery equipment which enables operation with a wide range of gases and an advanced plasma power system which allows operation at high temperatures and deposition rates. AMAT P-5000 utilizes a loadlock unit to load and unload materials. This eliminates the need for any operator intervention and ensures that product is not exposed to the harsh process environment. The insulated chamber contains two electrodes which are connected to a high voltage power supply to generate the plasma. APPLIED MATERIALS P 5000 uses a gas flow control machine to precisely regulate gas flow into the chamber. This tool is capable of providing measurements of flow rates, temperatures, and pressures in real-time to ensure optimal process operations. The flow control asset also allows for precise and repeatable process conditions for consistent film deposition. P-5000 is a highly versatile reactor capable of processing all types of substrates. It has an advanced temperature control model that enables even heating across the entire substrate surface for uniform film deposition. P5000 is also capable of depositing films at high rates over a large area and at different line speeds to achieve desired thickness and uniformity in the films. APPLIED MATERIALS P-5000 reactor is ideal for use in industries such as semiconductor and optoelectronic, flat panel display, MEMS, and photovoltaic, as well as in research and development settings. The UHV chamber and robust, reliable equipment design make it a great choice for applications that require comprehensive process control, precise temperature control, and reliable results. It is an easy to use, cost-effective system that is well suited for a variety of industrial and research applications requiring precise thin-film deposition.