Used AMAT / APPLIED MATERIALS P5000 #9185355 for sale

AMAT / APPLIED MATERIALS P5000 is a high-performance process reactor designed for use in chemical vapor deposition (CVD) and atomic layer deposition (ALD) applications. This low-cost, high-efficiency equipment offers excellent uniformity, reliability and repeatability for challenging deposition applications. It is designed for deposition of materials such as copper, silicon, tungsten, and aluminum. AMAT P-5000 reactor contains a vertically-aligned reaction chamber that allows for easy access and predictable results with every use. This compact system is built with a modular design for easy assembling and maintenance. The chamber is designed with a stainless steel water-cooled jacketing unit and is capable of operating under both ambient and vacuum conditions. The reaction chamber also contains a stainless steel chemical vapor injection machine, allowing users to precisely control the chemical composition of the gas within the tool. An automatic deposition valve is housed within the chamber and acts to regulate the supply of chemical vapor into the reaction chamber. This valve features an intuitive programmable soft-start mechanism and adjustable activation parameters, allowing users to adjust the flow of chemical vapor simply by adjusting the activation parameters. APPLIED MATERIALS P 5000 reactor also features a lift-out quartz view plate. This plate is used to inspect the coating's progress during the deposition process. The user can also use the view plate to conduct visual inspections once the deposition is complete. P-5000 reactor is equipped with a powerful and reliable electrical asset. This model is designed for the safe and accurate operation of the process reactor. The electrical equipment contains a built-in temperature controller and a variety of safety features, such as thermocouples and heaters, to ensure the safe operation of the system. P 5000 is an excellent choice for CVD and ALD processes. This process reactor is a cost-effective and reliable unit that provides excellent uniformity and repeatability, ensuring reliable and consistent deposition results.