Used AMAT / APPLIED MATERIALS P5000 #9190859 for sale

AMAT / APPLIED MATERIALS P5000 epitomizes novel reactor engineering for a broad range of applications. It is a fully automated plasma thermal chemical vapor deposition (PECVD) reactor ideal for film and coating processes. It is an advanced equipment capable of depositing a wide range of materials with precise control. As an in-line PECVD system, it has the capacity to provide high throughput with speed, quality, and controllability. AMAT P-5000 is designed with a robust and reliable process chamber that features a single port multi-purpose design. The port is a multi-purpose module equipped with a variety of optional substrate introducing, sample transport, gas delivery, and sample removal hardware. It is designed to provide controlled temperature and precise deposition rates over a wide range of temperatures and pressures inside the chamber. The chamber can sustain both low and high pressure with precise temperature control. The chamber is designed with a reinforced ceramic wall that ensures its durability and long lifetime. It also features precise plasma control and precise temperature measuring. APPLIED MATERIALS P 5000 is equipped with multi-axis robotics for precise substrate control. The control unit consists of a precise PLC-based robot controller that is integrated into the reactor machine. It offers precise actuation and precise movement control for multi-axis substrate positioning . Additionally, the precise PLC controller can control deposition parameters, including temperature, pressure, substrate size, deposition area, deposition angle and gas flow rate. This reactor has a high-performance motion controller and can be configured with multiple tool tips for different substrate size, angle and location features. It also features advanced software including easy-to-use Graphical User Interface (GUI). In terms of general operational performance, P5000 is equipped with an advanced temperature control tool that enables accurate and repeatable deposition results. It also offers superior process repeatability, real time image analysis, high repeatability of a single recipe, and a wide deposition window. Furthermore, this robust asset not only boosts productivity but also significantly reduces the cost of components and product turn-around time. In short, AMAT / APPLIED MATERIALS P-5000 is an automated PECVD reactor ideal for film and coating applications ensuring precise control and superior performance.