Used AMAT / APPLIED MATERIALS P5000 #9191088 for sale

AMAT / APPLIED MATERIALS P5000 is a 25mm enclosed reactor designed to enable a variety of thin film deposition processes. It provides comprehensive process control in a compact and economical package, making it ideal for the semiconductor, flat panel display and optoelectronic industries. AMAT P-5000 reactor is capable of providing advanced thin film deposition across various vacuum and plasma environments, including ultra high vacuum (UHV) and ultra low vacuum (ULV) conditions. Equipped with an Ultra-High-Voltage (UHV) power supply and advanced control system, it enables precision exploration of materials science to facilitate the deposition of thin films on a range of materials and substrates. The system's utilization of single- or double-sided processing is also ideal for manufacturing processes, in particular enabling the creation of thin-film heterojunctions. APPLIED MATERIALS P 5000 utilizes a proprietary work chamber platform that offers up to three temperature zones. This enables the efficient processing of a wide range of substrate sizes and shapes, allowing for a more versatile range of thin film deposition. The innovative design of the chamber enables sequential heating, cooling and film deposition options, thus allowing for faster and more efficient processing times. The reactor is also equipped with an advanced gas mixing system, capable of automatically controlling the mixture of gases as well as allowing for manual adjustment for optimum process control. This provides a measure of convenience and efficiency, as AMAT / APPLIED MATERIALS P-5000's digital control user interface enables recipe storage and retrieval, as well as the creation of specialized process sequences. P-5000 reactor is also uniquely equipped with a loadlock transfer port that allows for a wide range of sizes and shapes of substrates. This is coupled with a scanning electron microscope (SEM) that allows for on-the-spot analysis of thin films. This helps reduce costly processing and development time while ensuring a higher quality and tight control of process parameters and finished products. AMAT P 5000 is an advanced, highly capable reactor that is ideal for thin-film processes in many industries. It offers comprehensive process control features and ease of use, making it a valuable asset for those looking to maximize efficiency in the development and production of thin films.