Used AMAT / APPLIED MATERIALS P5000 #9193408 for sale

AMAT / APPLIED MATERIALS P5000 Reactor is a high-precision process tool designed for advanced semiconductor applications and materials research. It features temperatures ranging from 250°C to 1100°C, with a range of process gases, including pure N2, O2 and Ar. AMAT P-5000 Reactor also features high pressure, low thermal mass, high temperatures, and a low thermal time constant. APPLIED MATERIALS P 5000 Reactor is an in-situ tool capable of achieving a variety of deposition rates, including CVD and PVD processes. It can operate in either a vertical or a horizontal mode and can be used for the deposition and rapid thermal processing of single-crystals, nanoscale and multilayer films. AMAT P5000 Reactor is also suitable for applications in advanced semiconductor process development and device engineering. AMAT P 5000 Reactor is particularly useful for the production of nanoscale films and complex multilayers, as well as for the growth of high-density integrated circuits. It provides excellent kinetics and control, allowing for the control of film thickness, roughness, and other morphological parameters. Its large chamber size, low thermal mass, and low thermal time constant make it suitable for high-throughput production of functional layer materials. APPLIED MATERIALS P-5000 Reactor has a wide range of available processes and process recipes, and is capable of achieving high deposition rates and excellent uniformity. It is also capable of producing high-rate films under aggressive conditions. In addition to its wide range of process capabilities, P 5000 Reactor is fully automated, and can be easily integrated into existing manufacturing lines. P5000 Reactor is capable of operating in a wide range of temperature and pressure conditions. It features uniform temperature zones across the entire chamber, and utilizes active cooling to ensure uniformity and stability of process conditions. It also offers an integrated lifting system for easy lifting of components for direct process or material transfer. In conclusion, AMAT / APPLIED MATERIALS P 5000 Reactor is an advanced process tool designed for advanced semiconductor materials processing and research. It is capable of achieving high deposition rates, uniformity, and excellent kinetic control. Its large chamber size, low thermal mass, active cooling, and integrated lifting system make it suitable for a wide range of applications.