Used AMAT / APPLIED MATERIALS P5000 #9195270 for sale

AMAT / APPLIED MATERIALS P5000 is a plasma process reactor used in specialty electro-chemical deposition or etching operations. This reactor is capable of delivering plasma powers of up to 50 kW with chamber pressures up to 2×10-3 torr. In addition, this process reactor includes an integrated wafer loader and unloader, integrated cleaning systems and robust lighting systems. AMAT P-5000 reactor has a process chamber that is constructed from metal and ceramic components for shielding against static electricity and high temperatures. The metal components of the chamber are gas tight and include a full bore separation between process and exhaust chambers for efficient off-gas handling. APPLIED MATERIALS P 5000 reactor operates in a variety of gas atmospheres including hydrogen, helium, nitrogen and oxygen. In addition, it has a capability to process fluorocarbons, hydrochloric acid and other organic gases. The reactor chamber has a single stage PEM interface wherein the deposition is done on multiple substrates simultaneously. The process of deposition or etching is controlled with a low voltage DC current source. The reactants are gas injected serially through injection ports located around the external circumference of the chamber. The energy in the plasma is then directed at the substrate. This energy is enough to break bonds between the reactants and the substrate material, allowing for the deposition process. AMAT / APPLIED MATERIALS P-5000 reactor includes an integrated wafer loading system, which enables the loading and unloading of up to 12 substrates at once. The robot arm used in this system is designed to minimize human intervention for loading and unloading. The integrated elctro-cleaning systems provide rapid cleaning between processes, and the lighting system provides visual access during operation. AMAT P5000 is a versatile and capable reactor for complex electrochemical deposition or etching processes within a wide range of industrial, research and academic settings. This reactor is suitable for many applications, such as lithography, MEMS and semiconductor manufacturing.