Used AMAT / APPLIED MATERIALS P5000 #9196126 for sale

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ID: 9196126
Wafer Size: 8"
Vintage: 1995
Poly etcher, 8" Process: CVD P/N: 0010-09276 1995 vintage.
AMAT / APPLIED MATERIALS P5000 Reactor is a high-performance plasma deposition equipment which is used for semiconductor, plastic photo-etches, LED chipstack packaging, and other applications. It is a low temperature, high-power semiconductor process product from AMAT. AMAT P-5000 Reactor provides excellent uniformity, flexibility, and repeatability, making it the ideal system for a variety of semiconductor processes. APPLIED MATERIALS P 5000 Reactor is built with an advanced process chamber, which is equipped with a wide range of features that enhance the performance. It features a single wafer process that starts with an ultra-precise rotational wafer chuck, which is then heated and cooled with an active cooling unit which is designed to deliver consistent and repeatable doping, thicknesses, and other deposition parameters. The process chamber's pressure and temperature sensors provide stable control capabilities, while the fast switch-on/switch-off cycle makes sure the process is complete before it is ready to go onto the next cycle. The advanced design allows for a wide range of applications from metallization, dielectric films, to multiple layers of functional films. This machine enables accurate layer thickness control, which is adjustable on the fly for increased efficiency and uniformity. P 5000 Reactor also has an advanced control panel which allows the tool to be tuned to specific process requirements. It has a user-friendly graphical interface that enables easy viewing and monitoring of parameters at any time. The asset is also equipped with advanced safety features which provide peace of mind for operators, ensuring that the model can be safely operated. P-5000 Reactor has been designed to be flexible, reliable, and cost-effective. It is the perfect equipment for a wide range of semiconductor processes and applications, providing the highest quality and performance. P5000 Reactor allows the operator to achieve highest throughputs while easily controlling the uniformity, repeatability, and efficiency of the process. It has already been used in many applications with great success and is a proven system in the industry.
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