Used AMAT / APPLIED MATERIALS P5000 #9196360 for sale

AMAT / APPLIED MATERIALS P5000
ID: 9196360
Wafer Size: 8"
SACVD System, 8" PLIS System Process: USG BPSG Robot Storage elevator Chemical gas cabinet (3) Chambers (3) Ozone generators (3) RF Generators.
AMAT / APPLIED MATERIALS P5000 Reactor is a versatile, high-throughput plasma processing tool capable of producing high-quality results for a wide range of process requirements. It is designed for precision etching, deposition, and surface modification applications. AMAT P-5000 is an inline, batch-type equipment featuring dual process chambers, integrated robotic loading systems, and advanced plasma control algorithms. By combining an advanced multi-source plasma delivery system with fully-automated process control, APPLIED MATERIALS P 5000 provides unparalleled levels of process control, repeatability, and product quality. AMAT P5000's advanced process control technology includes a state-of-the-art closed-loop control unit which adjusts gas and plasma parameters in real-time according to process requirements. This improves process repeatability and accuracy while ensuring high-quality results. AMAT P 5000 also features a range of advanced plasma sources which can produce a variety of process gases including N2, O2, CF4, and SF6. The presence of these gas sources enables the use of advanced process recipes which enhance the etch and deposition capabilities of the machine. APPLIED MATERIALS P-5000 also offers a high level of process control flexibility, allowing users to precisely control the process parameters during operation. This allows the tool to produce high yields of quality product with minimal waste. Additionally, the asset allows the operator to adjust process variables to the specific needs of the application, making tuned-process optimization possible. The facility can also be easily integrated with external process control equipment, allowing for more complex processes to be carried out accurately. AMAT / APPLIED MATERIALS P-5000 Reactor is a highly versatile and robust plasma processing model designed for production-level performance and advanced process capabilities. Its advanced control algorithms, integrated robotics, and versatile gas source options make it suitable for a wide range of applications requiring exacting process control accuracy. Its high-throughput capabilities and the ability to quickly adjust process parameters make it an attractive solution for production-level implementations where time and cost efficiency are critical.
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