Used AMAT / APPLIED MATERIALS P5000 #9198050 for sale

AMAT / APPLIED MATERIALS P5000 is a highly efficient reactor equipment used in the fabrication of semiconductor wafers. It is comprised of a few key components which are all housed in a single, integrated platform. The process chamber is the primary component of AMAT P-5000 and is used to both process and deposit layers on to semiconductor wafers. It is a horizontal, 335mm-diameter vacuum chamber with a 250mm quartz boat system, surrounded by quartz walls. The process chamber is heated using two 250W microwave generators, two 30KW inductive couplers, and two 20KW E-beam guns, allowing it to achieve temperatures of up to 1,300 °C. It also features a gasbox with inlet and outlet ports and a gas distribution unit which provides the required gases during processing. The plasma source is the second major component of APPLIED MATERIALS P 5000, and is used to generate the plasma needed for processing. It comprises a 300W inductively coupled generator, a magnetron source, a gas distributor, and an F-series coil machine. The plasma source is typically operated in the "faire" mode and has selectable pressures, allowing precise control of ion energies and deposition rates. The RF power generator is the third major component of AMAT P 5000, and is used to power the chamber. It delivers a maximum power of 150kW, which is adjustable across a pulse frequency range of 300-1000 kHz. Its primary purpose is to provide the power necessary for processing wafers in the process chamber. The RF filtering tool is the fourth major component of P-5000, and is used to enhance the overall performance of the asset. It includes three filters to provide maximized power efficiency and circuit protection. The first filter, the switching filter, reduces high-frequency noise, while the second and third filters, the Pi and Chebychev filters, respectively, reduce spurs and out-of-band emissions. The final key component of APPLIED MATERIALS P-5000 is its controller, which enables the precise monitoring and controlling of all components during processing. It consists of an analog control loop which monitors the reactor temperature, pressure, and other parameters, and a digital control loop which controls the power levels of the chamber, plasma source, and RF generator. APPLIED MATERIALS P5000 is a highly efficient and versatile reactor model used in the fabrication of semiconductor wafers. Its integrated platform, composed of the process chamber, plasma source, RF power generator, RF filtering equipment, and controller, allows for precise control over the deposition process, allowing high-quality semiconductors to be consistently produced.