Used AMAT / APPLIED MATERIALS P5000 #9199844 for sale

AMAT / APPLIED MATERIALS P5000 is a state-of-the-art low-pressure, plasma reactor for processing semiconductor wafers. This equipment is specifically designed for controlled deposition, etching and cleaning of various types of materials and surfaces. AMAT P-5000 is capable of processing high aspect ratio photoresist applications. It is unique among plasma systems, as APPLIED MATERIALS P 5000 can handle advanced materials for both front-end-of-line (FEOL) and back-end-of-line (BEOL) operations. It is equipped with a high powered radio frequency (RF) generator capable of delivering up to 400 W of RF power, a unique process chamber that provides excellent plasma uniformity and select ability, and powerful programmable automation that has been optimized for silicon-based substrates. AMAT P 5000 is ideal for high aspect ratio processes, such as the patterning of narrow dimension lines and spacers. It provides outstanding etching speed and selectivity through the use of an integrated Hot-Wall RF power generator, enabling up to 400 W of RF power delivery. This results in a large processing window which helps to reduce the number of process steps needed to achieve an improved process outcome. AMAT P5000 utilizes an internal etch gas at a pressure of 0.1-100 mTorr with temperature control up to 450°C. It offers a high-performance automation system which enables the optimal combination of gas flow, temperature and pressure settings throughout the processing sequence. Additionally, the unit settings can be easily modified for a wide range of processes. The machine's proprietary chamber design consists of an advanced dual-mode water-cooled PREDSTORM® liner which effectively reduces plasma non-uniformity, enhancing process capability and repeatability. AMAT / APPLIED MATERIALS P 5000's patented Vertical Geometry Thermally Optimized Radial Longer (VG Tylor) injection tool efficiently supplies your process with Exhaust (Vacuum) and process & purge gases. P5000 offers excellent PC and mobile communication capabilities, allowing your staff to monitor and manage the asset from anywhere. This model utilizes a powerful oven control module (OCM) for exact temperature control, in-situ diagnostics and full wafer-level process control for maximum process repeatability. In conclusion, APPLIED MATERIALS P-5000 is a sophisticated, high-tech wafer reactor that offers unparalleled process control, enabling high quality deposition, etching, and cleaning operations. It provides superior gas uniformity, excellent temperature control and impressive PC/mobile communication capabilities. If your facility is looking to perform high quality, high-aspect-ratio processing, then P-5000 is the ideal choice.