Used AMAT / APPLIED MATERIALS P5000 #9201852 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced, high-end plasma etching reactor. It is capable of creating and etching intricate structures, ranging from micro-sized to macro-sized, in a wide variety of materials. It is typically used in the semiconductor industry for high-precision processing, such as photomasks, plating, chip packaging and wafer manufacturing. AMAT P-5000 utilizes a dual-mode desmear and passivation module, which enables the reactor to perform both etching and passivation functions simultaneously. The desmear module is capable of producing extremely uniform surface morphologies, while the passivation module can provide protective coatings on surfaces. This improves the performance and accuracy of the reactor, allowing for extremely precise etching. APPLIED MATERIALS P 5000 also has two multi-segment processing chambers. These chambers are designed to independently adjust the etching conditions, allowing for the etching of a wide range of materials. The chamber can be configured to control parameters such as the operating temperature, plasma power and the pressure inside the plasma chamber. This ensures that the end result has optimal etch characteristics. In addition to its etching capabilities, AMAT / APPLIED MATERIALS P 5000 is equipped with an advanced in-situ cleaning module. This module can be used to remove particulate matter from the substrate before etching, preventing damage to the substrate and ensuring a more accurate etching result. Finally, APPLIED MATERIALS P5000 is designed to run on a host of electrical and communication systems, allowing for seamless integration into existing production lines. This enables the reactor to easily communicate with other systems, as well as enable remote control of its operations. This simplifies the etching process, reduces downtime and improves efficiency. Overall, P 5000 is one of the most advanced etching systems in the market. Its combination of advanced etching capabilities, passivation and in-situ cleaning make it an ideal choice for precision production lines. In addition, its ability to easily integrate into existing processes and systems makes it an attractive option for industrial and research applications.