Used AMAT / APPLIED MATERIALS P5000 #9205257 for sale

AMAT / APPLIED MATERIALS P5000 reactor is an advanced plasma etching and deposition tool specifically designed for high performance fabrication of ICs, MEMS, and III-V devices. AMAT P-5000 reactor can achieve both thermal and plasma processes and is capable of supporting a wide variety of process geometries and materials. The reactor utilizes a high-density RF source with a specially designed antenna configuration to produce highly-dispersed and uniform plasma. This plasma system has been optimized to achieve high etch rates, superior process repeatability, and low EO and SE rates. APPLIED MATERIALS P 5000 reactor comes with a range of advanced deposition and etching capabilities which can be tailored to meet specific customer needs. This includes the ability to process small features down to 25mm or less and up to a large diameter of 1,500mm. Additionally, AMAT P5000 reactor can accommodate up to six process chambers that can be powered by Gas Mixers and Mass Flow Controllers, allowing for customized process recipes. Furthermore, P5000 reactor can employ advanced vacuum conditions and plasma parameters, providing greater process repeatability and uniformity. The reactor is also designed to minimize memory effects, minimize plasma loading and minimize wafer heating. All this combined makes APPLIED MATERIALS P-5000 an indispensable tool in the fabrication of semiconductor and micro-electro-mechanical components.