Used AMAT / APPLIED MATERIALS P5000 #9210301 for sale

AMAT / APPLIED MATERIALS P5000 is an advanced plasma processes reactor designed for semiconductor fabrication. The reactor offers a range of features designed to meet the increasingly complex requirements of modern semiconductor processing. The equipment can be used for a variety of processes, including etch, deposition, and implant. AMAT P-5000 features a multi-zone draw-type process chamber that is designed to facilitate higher throughput, better uniformity, and improved yields. The chamber is surrounded by a series of closely coupled auxiliary process modules, including a remote plasma source, an RF generator, a controller, an electron-cyclotron resonance box, and a mass flow controller. APPLIED MATERIALS P 5000 also has integrated surface characterization capabilities, enabling it to measure film thickness, resistivity, and other parameters. AMAT P5000 uses a direct-drive vacuum system to maintain a low-pressure environment. This allows the chamber to reach a base pressure of 5 mTorr, making the reactor well-suited for both high- and low-pressure plasma processes. The unit also has adjustable gas systems that allow for precise gas flow control, which facilitates repeatable process results. P-5000 is designed for high-performance plasma operations involving a variety of etches, plasma-enhanced chemical vapor deposition, and ion-beam implantation. It features large single piece, center-opening wafers, and small multiple piece wafers up to 8-inch. The large wafers can be heated up to 130°C and the small wafers up to 400°C. The machine also features high-speed wafer load/unload capability and a high-speed gas panel for fast, precision gas delivery. APPLIED MATERIALS P5000 is designed for use in a variety of applications, including the fabrication of VLSI circuits, semiconductor power devices, MEMS devices, and optical structures. The tool is supported by a powerful host computer asset, which can be used to monitor and control device parameters such as pressure, wafer temperature, and time. The software also includes a 3D modeling feature that can be used to visualize and optimize process results. AMAT P 5000 is a feature-rich, advanced reactor that is designed to meet the evolving needs of the semiconductor industry. The reactor provides precise temperature, pressure, and gas control, allowing detailed control of the process environment. With its large wafer capacities, high-speed wafer handling, and high-precision process capabilities, P5000 is an ideal solution for a variety of advanced plasma processes.