Used AMAT / APPLIED MATERIALS P5000 #9210302 for sale

AMAT / APPLIED MATERIALS P5000 is an Inductively Coupled Plasma (ICP) reactor designed for highly efficient, precision etching of patterned and blanket films. The reactor enables uniform plasma composition and temperature distribution across the substrate, providing superb crystal quality and improved etch profiles with minimal variation. The equipment is fully automated with advanced process control, monitoring, and remote support, allowing for quick and easy set up and access to the process parameters. AMAT P-5000 is powered by a highly efficient electron cyclotron resonance (ECR) source which provides high-density plasma and high control over the etch mechanisms. The ICP system also features a hybrid pulsed frequency power supply for superior electrical performance and superior top-down anisotropic etch results. The unit is designed to etch in three dimensions, allowing for patterning of complex 3D structures which are needed for the production of state-of-the-art electronics and optoelectronics components. APPLIED MATERIALS P 5000's sophisticated automated processes are managed through a graphical user interface, and the machine is equipped with advanced process control, monitoring, and over-pressure capabilities. The tool is capable of handling a wide range of substrate materials, such as Si, SiO2, Si3N4, and polysilicon, enabling the production of micro-scale patterns and structures down to 25nm. P5000 has been proven to be highly reliable and efficient in etching operations, and it provides the highest throughput with efficient utilization of consumables, reduced process cycle times, and improved vacuum asset performance. Additionally, the model is designed to be low-maintenance and low-cost, with minimal downtime. The reactor also facilitates cleanroom-friendly installations and operation, with a minimal environmental impact. Overall, P-5000 is an advanced ICP etch-equipment designed to provide lead times, consistent accuracy and repeatable process results. Its versatile features enable the production of complex 3D structures, enabling the production of highly advanced and reliable electronics and optoelectronics components.